Focused beam scatterometry for deep subwavelength metrology

Thomas G. Brown; Miguel A. Alonso; Anthony Vella; Michael J. Theisen; Stephen T. Head; Steven R. Gillmer; Jonathan D. Ellis

doi:10.1117/12.2045651

12 March 2014 Focused beam scatterometry for deep subwavelength metrology

Thomas G. Brown, Miguel A. Alonso, Anthony Vella, Michael J. Theisen, Stephen T. Head, Steven R. Gillmer, Jonathan D. Ellis

Author Affiliations +

Proceedings Volume 8949, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI; 89490Y (2014) https://doi.org/10.1117/12.2045651
Event: SPIE BiOS, 2014, San Francisco, California, United States

Abstract

It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

Citation Download Citation

Thomas G. Brown, Miguel A. Alonso, Anthony Vella, Michael J. Theisen, Stephen T. Head, Steven R. Gillmer, and Jonathan D. Ellis "Focused beam scatterometry for deep subwavelength metrology", Proc. SPIE 8949, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI, 89490Y (12 March 2014); https://doi.org/10.1117/12.2045651

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