The papers included in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. The papers published in these proceedings reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from this book: Author(s), “Title of Paper,” in Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XIX, edited by Yoshiki Nakata, Xianfan Xu, Stephan Roth, Beat Neuenschwander, Proceedings of SPIE Vol. 8967 (SPIE, Bellingham, WA, 2014) Article CID Number. ISSN: 0277-786X ISBN: 9780819498809 Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 SPIE.org Copyright © 2014, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/14/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library.
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The CID Number appears on each page of the manuscript. The complete citation is used on the first page, and an abbreviated version on subsequent pages. Numbers in the index correspond to the last two digits of the six-digit CID Number. Conference CommitteeSymposium Chairs Bo Gu, Bos Photonics (United States) Andreas Tünnermann, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany) and Friedrich-Schiller-Universität Jena (Germany)
Symposium Co-chairs Guido Hennig, Daetwyler Graphics AG (Switzerland) Yongfeng Lu, University of Nebraska-Lincoln (United States)
Program Track Chairs Henry Helvajian, The Aerospace Corporation (United States) Alberto Piqué, U.S. Naval Research Laboratory (United States)
Conference Chairs Yoshiki Nakata, Osaka University (Japan) Xianfan Xu, Purdue University (United States) Stephan Roth, BLZ Bayerisches Laserzentrum GmbH (Germany) Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)
Conference Program Committee Craig B. Arnold, Princeton University (United States) J. Thomas Dickinson, Washington State University (United States) Jan J. Dubowski, Université de Sherbrooke (Canada) Bo Gu, Bos Photonics (United States) Guido Hennig, Daetwyler Graphics AG (Switzerland) Henry Helvajian, The Aerospace Corporation (United States) Yongfeng Lu, University of Nebraska-Lincoln (United States) Michel Meunier, Ecole Polytechnique de Montréal (Canada) Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan) Andreas Ostendorf, Ruhr-Universität Bochum (Germany) Alberto Piqué, U.S. Naval Research Laboratory (United States) Gediminas Raciukaitis, Center for Physical Sciences and Technology (Lithuania) Andrei V. Rode, The Australian National University (Australia) Pere Serra, Universitat de Barcelona (Spain) Klaus Sokolowski-Tinten, Universität Duisburg-Essen (Germany) Razvan Stoian, Laboratoire Hubert Curien (France) Koji Sugioka, RIKEN (Japan)
Session Chairs 1 Laser-induced Modification and Patterning of Surfaces I: Joint Session with Conferences 8967 and 8969 Yoshiki Nakata, Osaka University (Japan) 2 Laser-induced Modification and Patterning of Surfaces II: Joint Session with Conferences 8967 and 8969 Xianfan Xu, Purdue University (United States) 3 Nanomaterial Photonics and Plasmonics I: Joint Session with Conferences 8967 and 8969 Richard F. Haglund Jr., Vanderbilt University (United States) 4 Nanomaterial Photonics and Plasmonics II: Joint Session with Conferences 8967 and 8969 Jan J. Dubowski, Université de Sherbrooke (Canada) 5 Ultrafast Laser-induced Modifications of Transparent Materials: Joint Session with Conferences 8967 and 8972 Stefan Nolte, Friedrich-Schiller-Universität Jena (Germany) 6 Beam Shaping: Joint Session with Conferences 8967 and 8972 Peter R. Herman, University of Toronto (Canada) 7 Adaptive Optics and Beam Shaping: Joint Session with Conferences 8967 and 8972 Stephan Roth, BLZ Bayerisches Laserzentrum GmbH (Germany) 8 Ultrashort Pulse Micromachining: Joint Session with Conferences 8967 and 8972 Andreas Ostendorf, Ruhr-Universität Bochum (Germany) 9 Materials for Energy Conservation Yongfeng Lu, University of Nebraska-Lincoln (United States) 10 Enhanced Processing by Multi-pulse Stephan Roth, BLZ Bayerisches Laserzentrum GmbH (Germany) 11 Annealing and Forming of Microstructures Klaus Sokolowski-Tinten, Universität Duisburg-Essen (Germany) 12 Applications and Diagnostics of Laser Transfer Techniques: Joint Session with Conferences 8967 and 8970 Masayuki Okoshi, National Defense Academy (Japan) Daisuke Nakamura, Kyushu University (Japan) 13 Time-resolved Diagnostic Techniques Masaaki Sakakura, Kyoto University (Japan) 14 Processing and Diagnostics of Photovoltaics Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland) 15 Photovoltaics and Energy Devices: Joint Session with Conferences 8967 and 8968 Yoshiki Nakata, Osaka University (Japan) Udo Klotzbach, Fraunhofer IWS Dresden (Germany)
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