7 March 2014 Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold
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In this work, 3-D nanoscale line patterns were fabricated on SU-8 layers by Ga+ focused ion beam (FIB) lithography and used as Nanoimprint lithography (NIL) mold. Both V-shape side wall and opposing dose deficiency effect were observed and analyzed during the FIB milling process. Different beam currents were utilized to fabricate SU-8 pattern and it is found that the lower beam currents provide higher quality pattern with smooth edges and straight side walls. In addition, the impact of crosslink density of SU-8 material on the FIB milling efficiency was discussed. Both thermal and ultraviolet (UV) NIL were conducted using these line patterns to study the deformation of SU-8 mold and filling ratio of imprinting material. The experiments revealed that the imprint pressure and physic properties of imprinting material are the most critical factors in these NIL processes.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junwei Su, Junwei Su, Fan Gao, Fan Gao, Zhiyong Gu, Zhiyong Gu, Wen Dai, Wen Dai, George Cernigliaro, George Cernigliaro, Hongwei Sun, Hongwei Sun, } "Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold", Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 897409 (7 March 2014); doi: 10.1117/12.2039832; https://doi.org/10.1117/12.2039832


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