7 March 2014 Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold
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In this work, 3-D nanoscale line patterns were fabricated on SU-8 layers by Ga+ focused ion beam (FIB) lithography and used as Nanoimprint lithography (NIL) mold. Both V-shape side wall and opposing dose deficiency effect were observed and analyzed during the FIB milling process. Different beam currents were utilized to fabricate SU-8 pattern and it is found that the lower beam currents provide higher quality pattern with smooth edges and straight side walls. In addition, the impact of crosslink density of SU-8 material on the FIB milling efficiency was discussed. Both thermal and ultraviolet (UV) NIL were conducted using these line patterns to study the deformation of SU-8 mold and filling ratio of imprinting material. The experiments revealed that the imprint pressure and physic properties of imprinting material are the most critical factors in these NIL processes.
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Junwei Su, Junwei Su, Fan Gao, Fan Gao, Zhiyong Gu, Zhiyong Gu, Wen Dai, Wen Dai, George Cernigliaro, George Cernigliaro, Hongwei Sun, Hongwei Sun, "Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold", Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 897409 (7 March 2014); doi: 10.1117/12.2039832; https://doi.org/10.1117/12.2039832


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