7 March 2014 Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection
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Abstract
The fabrication of complex nano-optical structures for plasmonics, photonic-crystals, or meta-materials on application relevant areas by electron-beam lithography requires a highly parallel writing strategy. In case of periodic pattern as they are found in most of the mentioned optical elements this can be achieved by a so called character projection writing principle where complex exposure pattern are coded in a stencil mask and exposed with a single shot. Resulting shotcount and writing time reductions compared to standard Variable-Shaped-Beam exposures can be in the order of 100...10000. The limitation in flexibility by using hard-coded exposure shapes can be overcome by implementing the character projection principle with a highly precise motorized aperture stage capable of carrying several 1000 different apertures. Examples of nano-optical elements fabricated with the new character projection principle are presented.
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Uwe D. Zeitner, Torsten Harzendorf, Frank Fuchs, Michael Banasch, Holger Schmidt, Ernst-Bernhard Kley, "Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection", Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 89740G (7 March 2014); doi: 10.1117/12.2040206; https://doi.org/10.1117/12.2040206
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