8 March 2014 Optical properties of m-plane GaN grown on patterned Si(112) substrates by MOCVD using a two-step approach
Author Affiliations +
Abstract
Nonpolar m-plane GaN layers were grown on patterned Si (112) substrates by metal-organic chemical vapor deposition (MOCVD). A two-step growth procedure involving a low-pressure (30 Torr) first step to ensure formation of the m-plane facet and a high-pressure step (200 Torr) for improvement of optical quality was employed. The layers grown in two steps show improvement of the optical quality: the near-bandedge photoluminescence (PL) intensity is about 3 times higher than that for the layers grown at low pressure, and deep emission is considerably weaker. However, emission intensity from m-GaN is still lower than that of polar and semipolar (1 100 ) reference samples grown under the same conditions. To shed light on this problem, spatial distribution of optical emission over the c+ and c wings of the nonpolar GaN/Si was studied by spatially resolved cathodoluminescence and near-field scanning optical microscopy.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Izyumskaya, S. Okur, F. Zhang, M. Monavarian, V. Avrutin, Ü. Özgür, S. Metzner, C. Karbaum, F. Bertram, J. Christen, H. Morkoç, "Optical properties of m-plane GaN grown on patterned Si(112) substrates by MOCVD using a two-step approach", Proc. SPIE 8986, Gallium Nitride Materials and Devices IX, 898628 (8 March 2014); doi: 10.1117/12.2037930; https://doi.org/10.1117/12.2037930
PROCEEDINGS
7 PAGES


SHARE
Back to Top