8 March 2014 Application of atomic layer deposition in nanophotonics
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We review our recent results on using Atomic Layer Deposition (ALD) in fabrication of nanophotonic waveguide devices. ALD is a unique thin film deposition method providing atomic level control of film composition and thickness, perfect step coverage, and large-area uniformity. We employ the advantages of ALD in connection with Sinanophotonics. We present several new structures based on filling silicon slot waveguides or coating the silicon strip waveguides with ALD-grown materials. Also ALD grown TiO2 strip waveguides are introduced.
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Lasse Karvonen, Lasse Karvonen, Antti Säynätjoki, Antti Säynätjoki, Matthieu Roussey, Matthieu Roussey, Markku Kuittinen, Markku Kuittinen, Seppo Honkanen, Seppo Honkanen, "Application of atomic layer deposition in nanophotonics", Proc. SPIE 8988, Integrated Optics: Devices, Materials, and Technologies XVIII, 89880Z (8 March 2014); doi: 10.1117/12.2042263; https://doi.org/10.1117/12.2042263

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