8 March 2014 Ion beam irradiated optical channel waveguides
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Abstract
Nowadays, in the modern optical communications systems, channel waveguides represent the core of many active and passive integrated devices, such as amplifiers, lasers, couplers and splitters. Different materials and fabrication processes were investigated in order to achieve the aforementioned optoelectronic circuits with low costs and high performance and reproducibility. Nevertheless, the 2D guiding structures fabrication continues to be a challenging task in some of optical materials due to their susceptibility to mechanical and/or chemical damages which can occur during the different steps of the fabrication process. Here we report on channel waveguides demonstration in erbium doped Tungsten – Tellurite (Er3+:TeO2-WO3) glasses and BGO crystals by means of a masked ion beam and/or direct writing processes performed at different energy MeV and ions species. The evidence of the waveguides formation was investigated by microscopy techniques and micro Raman spectroscopy.
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I. Bányász, I. Rajta, G. U. L. Nagy, Z. Zolnai, V. Havranek, S. Pelli, M. Veres, L. Himics, S. Berneschi, G. Nunzi-Conti, G. C. Righini, "Ion beam irradiated optical channel waveguides", Proc. SPIE 8988, Integrated Optics: Devices, Materials, and Technologies XVIII, 898814 (8 March 2014); doi: 10.1117/12.2041697; https://doi.org/10.1117/12.2041697
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