8 March 2014 Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform
Author Affiliations +
Proceedings Volume 8990, Silicon Photonics IX; 89900F (2014) https://doi.org/10.1117/12.2039954
Event: SPIE OPTO, 2014, San Francisco, California, United States
We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 μm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matteo Cherchi, Matteo Cherchi, Sami Ylinen, Sami Ylinen, Mikko Harjanne, Mikko Harjanne, Markku Kapulainen, Markku Kapulainen, Tapani Vehmas, Tapani Vehmas, Timo Aalto, Timo Aalto, George T. Kanellos, George T. Kanellos, Dimitris Fitsios, Dimitris Fitsios, Nikos Pleros, Nikos Pleros, } "Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform", Proc. SPIE 8990, Silicon Photonics IX, 89900F (8 March 2014); doi: 10.1117/12.2039954; https://doi.org/10.1117/12.2039954


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