8 March 2014 Six-axis interferometric coordinates measurement system for nanometrology
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Proceedings Volume 8992, Photonic Instrumentation Engineering; 89920W (2014) https://doi.org/10.1117/12.2054802
Event: SPIE OPTO, 2014, San Francisco, California, United States
We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.
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Jan Hrabina, Jan Hrabina, Josef Lazar, Josef Lazar, Petr Klapetek, Petr Klapetek, Miroslav Valtr, Miroslav Valtr, Ondrej Cip, Ondrej Cip, Jindrich Oulehla, Jindrich Oulehla, Martin Cizek, Martin Cizek, Miroslava Hola, Miroslava Hola, Mojmir Sery, Mojmir Sery, "Six-axis interferometric coordinates measurement system for nanometrology", Proc. SPIE 8992, Photonic Instrumentation Engineering, 89920W (8 March 2014); doi: 10.1117/12.2054802; https://doi.org/10.1117/12.2054802

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