19 December 2013 Off-line inspection method of microlens array for illumination homogenization in DUV lithography machine
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Abstract
Illumination uniformity is one of the key specifications of lithography illumination system because of its strong influence on the critical dimension (CD) uniformity in optical lithography. Refractive microlens array (MLA) has been extensively adopted in lithography system to achieve highly homogeneous illumination field with less light loss relative to diffractive element. Off-line homogenization inspection of the MLA provides important data for entire system integration. It is still a challenge work to investigate the optical performance for such high-end MLA with large clear aperture and high sensitivity to the incident light parameters. In order to address these issues, subaperture stitching method has been proposed to be applied and studied in this work. The feasibility of this method has been verified by theoretical simulation of a diffracting homogenizer. In the experiment, a corresponding optical setup is constructed, and a crossed-cylindrical single-plate MLA has been tested. The experimental results are consistent with the simulation ones. It could be concluded that subaperture stitching method is a powerful method to evaluate the homogeneous performance of MLA.
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Fang Zhang, Jing Zhu, Baoxi Yang, Lihua Huang, Xiaobang Hu, Yanfen Xiao, Huijie Huang, "Off-line inspection method of microlens array for illumination homogenization in DUV lithography machine", Proc. SPIE 9046, 2013 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 904619 (19 December 2013); doi: 10.1117/12.2037841; https://doi.org/10.1117/12.2037841
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