21 December 2013 The fabrication of the holographic dual-blazed grating
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Proceedings Volume 9047, 2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication; 90470F (2013); doi: 10.1117/12.2036785
Event: International Conference on Optical Instruments and Technology (OIT2013), 2013, Beijing, China
Abstract
A holographic dual-blazed grating with the period of 833 nm at ultraviolet-visible-near infrared was designed. To achieve higher and uniform diffraction efficiency, the grating profile was optimized by using rigorous coupled-wave analysis. The results show: when the two blaze angles of the dual-blazed grating, one within the range from 10 degree to 12 degree and the other one within the range from 26 degree to 32 degree respectively, the first-order diffraction efficiency is more than 30 percent within the wavelength from 0.25μm to 1μm. The holographic dual-blazed grating, one half with the blaze angle of 11 degree and the anti-blaze angle of 72 degree; and the other half with the blaze angle of 29 degree and the anti-blaze angle of 56 degree respectively, have been fabricated by improved holographic ion beam etching.
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Quan Liu, Jianhong Wu, Minghui Chen, Yu Cheng, "The fabrication of the holographic dual-blazed grating", Proc. SPIE 9047, 2013 International Conference on Optical Instruments and Technology: Micro/Nano Photonics and Fabrication, 90470F (21 December 2013); doi: 10.1117/12.2036785; http://dx.doi.org/10.1117/12.2036785
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KEYWORDS
Diffraction gratings

Diffraction

Etching

Holography

Ion beams

Photomasks

Photoresist materials

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