EUV source modeling

S. Kulkarni; I. Golovkin; J. MacFarlane

doi:10.1117/12.2044783

18 March 2014 EUV source modeling

S. Kulkarni, I. Golovkin, J. MacFarlane

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90481T (2014) https://doi.org/10.1117/12.2044783
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We demonstrate the use of Prism Computational Sciences software models to understand the fundamental physical processes in EUVL (Extreme Ultraviolet Lithography) plasma. HELIOS-CR is a 1-D radiation-magnetohydrodynamics code used to simulate the dynamic evolution of laser-produced plasmas (LPP) such as Sn or Xe plasmas used often in EUVL. The results of HELIOS-CR simulations can be post-processed using multidimensional spectral analysis code SPECT3D to generate images and spectra that include instrumental effects, and therefore can be directly compared with experimental measurements being made to generate EUVL. The SPECT3D package computes filtered and monochromatic images, and streaked, time-integrated, and time-gated spectra based on 1-D, 2-D, or 3-D radiation-hydrodynamics results. Simulated images and spectra can be computed with instrumental effects included (e.g., spectrometer resolution, time gating, filtering) in order to facilitate comparisons with experimental data. We present results which demonstrate impact of various parameters (laser power - pre-pulse and main pulse, spot size, pre-pulse and main pulse delay, etc.) on efficiency in EUVL, and shows possible improvement areas to achieve higher efficiency.

Citation Download Citation

S. Kulkarni, I. Golovkin, and J. MacFarlane "EUV source modeling", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481T (18 March 2014); https://doi.org/10.1117/12.2044783

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