Highly-efficient high-power pulsed CO2 laser characterized by transverse-flow laser amplifiers

Yoichi Tanino; Jun-ichi Nishimae; Tatsuya Yamamoto; Taichiro Tamida; Koji Funaoka; Shuichi Fujikawa

doi:10.1117/12.2045566

17 April 2014 Highly-efficient high-power pulsed CO₂ laser characterized by transverse-flow laser amplifiers

Yoichi Tanino, Jun-ichi Nishimae, Tatsuya Yamamoto, Taichiro Tamida, Koji Funaoka, Shuichi Fujikawa

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90480E (2014) https://doi.org/10.1117/12.2045566
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In this paper, we provide a detailed review of development of a highly-efficient high-power nanosecond pulse CO₂ laser using transverse-flow radio-frequency (RF)-exited laser amplifiers, which is for extreme ultraviolet (EUV) light source of a next generation of nano-lithography. High-density excited high-power transverse-flow CO₂ lasers were designed and built for the application of laser produced plasma (LPP) EUV source. We carried out an amplification test of the transverse-flow CO₂ laser seeded by a nanosecond pulse CO₂ laser. A four-amplifier system generated an average output power of 21 kW with an electrical input power of 400 kW for discharges. The electrical-to-optical efficiency was 5.2%. The input pulse laser had an average power of 46 W, the repetition rate was 100 kHz, and the pulse duration was 15 ns. The transverse-flow CO₂ laser has strong points in high gain and availability of the multi-fold optical path. A highly-efficient amplification was experimentally proved characterized by transverse-flow CO₂ laser amplifiers even with low-power seed. A transverse-flow CO₂ laser is a promising candidate for an amplifier in the LPP EUV light source.

Citation Download Citation

Yoichi Tanino, Jun-ichi Nishimae, Tatsuya Yamamoto, Taichiro Tamida, Koji Funaoka, and Shuichi Fujikawa "Highly-efficient high-power pulsed CO₂ laser characterized by transverse-flow laser amplifiers", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480E (17 April 2014); https://doi.org/10.1117/12.2045566

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