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24 April 2014 Actinic review of EUV masks: first results from the AIMS EUV system integration
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The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks, actinic review of potential defect sites is required. To realize such an actinic review tool, Zeiss and the SEMATECH EUVL Mask Infrastructure consortium started a development programme for an EUV aerial image metrology system (AIMS™ EUV). In this paper, we discuss the status of the on-going system integration and show first results from the first light tests of the prototype tool.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Markus R. Weiss, Dirk Hellweg, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, and Michael Goldstein "Actinic review of EUV masks: first results from the AIMS EUV system integration", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480X (24 April 2014);


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