17 April 2014 High-radiance LDP source for mask inspection application
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Abstract
High-radiance EUV source is needed for actinic mask inspection applications. LDP source for a lithography application was found to be also able to provide sufficient radiance for mask inspection purpose. Since the plasma size of LDP is properly larger than LPP, not only radiance but also power is suitable for mask inspection applications. Operating condition such as discharge pulse energy, discharge frequency and laser parameter have been tuned to maximize radiance. Introduction of new techniques and several modifications to LDP source have brought radiance level to 180 W/mm2/sr at plasma (or 130 W/mm2/sr as clean-photon radiance). The LDP source is operated at moderate power level in order to ensure sufficient component lifetime and reliability. The first lifetime test done at 10 kHz resulted in 6.5 Gpulse without failure. Debris mitigation system has been successfully installed showing optical transmission as high as 71 %.
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Yusuke Teramoto, Yusuke Teramoto, Bárbara Santos, Bárbara Santos, Guido Mertens, Guido Mertens, Ralf Kops, Ralf Kops, Margarete Kops, Margarete Kops, Felix Küpper, Felix Küpper, Gota Niimi, Gota Niimi, Hironobu Yabuta, Hironobu Yabuta, Akihisa Nagano, Akihisa Nagano, Takuma Yokoyama, Takuma Yokoyama, Masaki Yoshioka, Masaki Yoshioka, Takahiro Shirai, Takahiro Shirai, Noritaka Ashizawa, Noritaka Ashizawa, Hiroto Sato, Hiroto Sato, Kiyotada Nakamura, Kiyotada Nakamura, Kunihiko Kasama, Kunihiko Kasama, } "High-radiance LDP source for mask inspection application", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904813 (17 April 2014); doi: 10.1117/12.2046423; https://doi.org/10.1117/12.2046423
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