Increasing sensitivity of oxide nanoparticle photoresists

Souvik Chakrabarty; Chandra Sarma; Li Li; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2046555

17 April 2014 Increasing sensitivity of oxide nanoparticle photoresists

Souvik Chakrabarty, Chandra Sarma, Li Li, Emmanuel P. Giannelis, Christopher K. Ober

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90481C (2014) https://doi.org/10.1117/12.2046555
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Previous investigations on the patterning mechanism of nanoparticle photoresists provided insight into ligand displacement exerting a controlling influence on dissolution behavior of nanoparticles in organic developers. Nanoparticle core-ligand interaction which dictates ligand displacement would ultimately translate to the sensitivity of the photoresist. The current study investigates enhancement of resist sensitivity via altering the core-ligand interaction of the nanoparticle, which further emphasizes our proposed patterning hypothesis.

Citation Download Citation

Souvik Chakrabarty, Chandra Sarma, Li Li, Emmanuel P. Giannelis, and Christopher K. Ober "Increasing sensitivity of oxide nanoparticle photoresists", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481C (17 April 2014); https://doi.org/10.1117/12.2046555

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