This paper will present an update from the 0.5 NA EUVL program. We will detail the more significant activities that are being undertaken to upgrade the MET and discuss expected performance.
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Kevin Cummings, Dominic Ashworth, Mark Bremer, Rodney Chin, Yu-Jen Fan, Luc Girard, Holger Glatzel, Michael Goldstein, Eric Gullikson, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Johannes Bauer, Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen, Stefan Wurm, "Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)," Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481M (17 April 2014);