17 April 2014 Progress on EUV pellicle development
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Abstract
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle. In order to secure reticle front side particle adders to an acceptable level for high volume manufacturing, EUV pellicle is being actively investigated. Last year ASML reported on our initial EUV pellicle feasibility. In this paper, we will update on our progress since then. We will also provide an update to pellicle requirements published last year. Further, we present experimental results showing the viability and challenges of potential EUV pellicle materials, including, material properties, imaging capability, scalability and manufacturability.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Carmen Zoldesi, Kursat Bal, Brian Blum, Guus Bock, Derk Brouns, Florian Dhalluin, Nina Dziomkina, Juan Diego Arias Espinoza, Joost de Hoogh, Silvester Houweling, Maarten Jansen, Mohammad Kamali, Alain Kempa, Ronald Kox, Robert de Kruif, Jorge Lima, Yang Liu, Henk Meijer, Hans Meiling, Ijen van Mil, Marco Reijnen, Luigi Scaccabarozzi, Daniel Smith, Beatrijs Verbrugge, Laurens de Winters, Xugang Xiong, John Zimmerman, "Progress on EUV pellicle development", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481N (17 April 2014); doi: 10.1117/12.2049276; https://doi.org/10.1117/12.2049276
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