17 April 2014 Progress on EUV pellicle development
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Abstract
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle. In order to secure reticle front side particle adders to an acceptable level for high volume manufacturing, EUV pellicle is being actively investigated. Last year ASML reported on our initial EUV pellicle feasibility. In this paper, we will update on our progress since then. We will also provide an update to pellicle requirements published last year. Further, we present experimental results showing the viability and challenges of potential EUV pellicle materials, including, material properties, imaging capability, scalability and manufacturability.
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Carmen Zoldesi, Carmen Zoldesi, Kursat Bal, Kursat Bal, Brian Blum, Brian Blum, Guus Bock, Guus Bock, Derk Brouns, Derk Brouns, Florian Dhalluin, Florian Dhalluin, Nina Dziomkina, Nina Dziomkina, Juan Diego Arias Espinoza, Juan Diego Arias Espinoza, Joost de Hoogh, Joost de Hoogh, Silvester Houweling, Silvester Houweling, Maarten Jansen, Maarten Jansen, Mohammad Kamali, Mohammad Kamali, Alain Kempa, Alain Kempa, Ronald Kox, Ronald Kox, Robert de Kruif, Robert de Kruif, Jorge Lima, Jorge Lima, Yang Liu, Yang Liu, Henk Meijer, Henk Meijer, Hans Meiling, Hans Meiling, Ijen van Mil, Ijen van Mil, Marco Reijnen, Marco Reijnen, Luigi Scaccabarozzi, Luigi Scaccabarozzi, Daniel Smith, Daniel Smith, Beatrijs Verbrugge, Beatrijs Verbrugge, Laurens de Winters, Laurens de Winters, Xugang Xiong, Xugang Xiong, John Zimmerman, John Zimmerman, } "Progress on EUV pellicle development", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481N (17 April 2014); doi: 10.1117/12.2049276; https://doi.org/10.1117/12.2049276
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