17 April 2014 TNO reticle handling test platform
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Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 904831 (2014); doi: 10.1117/12.2047377
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States
Particle free handling of EUV reticles is a major concern in industry. For reaching economically feasible yield levels, it is reported that Particle-per-Reticle-Pass (PRP) levels should be better than 0.0001 for particles larger than 18 nm. Such cleanliness levels are yet to be reported for current reticle handling systems. A reticle handler was built based on a modular concept with three uniform linked base frames. In the first stage of the project a dual pod loading unit, two exchange units for opening inner pods and a reticle flip unit are installed on the base frames. In the near future improvements on cleanliness will be tested and particle detection equipment will be integrated. The system will act as a testing platform for clean handling technology for industry.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
W. E. Crowcombe, C. L. Hollemans, E. C. Fritz, J. C. J. van der Donck, N. B. Koster, "TNO reticle handling test platform", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904831 (17 April 2014); doi: 10.1117/12.2047377; https://doi.org/10.1117/12.2047377

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