28 March 2014 Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends
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Abstract
Further enhancements to Monte Carlo and Self-Consistent Field Theory Directed Self-Assembly (DSA) simulation capabilities implemented in GLOBALFOUNDRIES are presented and discussed, along with the results of their applications. We present the simulation studies of DSA in graphoepitaxy confinement wells, where the DSA process parameters are varied in order to determine the optimal set of parameters resulting in a robust and etch transferrable phase morphology. A novel concept of DSA-aware assist features for the optical lithography process is presented and demonstrated in simulations. The results of the DSA simulations and studies for the DSA process using a blend of homopolymers and diblock copolymers are also presented and compared with the simulated diblock copolymer systems.
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Azat Latypov, Azat Latypov, Tamer H. Coskun, Tamer H. Coskun, Grant Garner, Grant Garner, Moshe Preil, Moshe Preil, Gerard Schmid, Gerard Schmid, Ji Xu, Ji Xu, Yi Zou, Yi Zou, } "Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904908 (28 March 2014); doi: 10.1117/12.2046082; https://doi.org/10.1117/12.2046082
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