High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography

Sami Sabik; Joris de Riet; Iryna Yakimets; Edsger Smits

doi:10.1117/12.2046479

28 March 2014 High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography

Sami Sabik, Joris de Riet, Iryna Yakimets, Edsger Smits

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90490F (2014) https://doi.org/10.1117/12.2046479
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Flexible electronics is a growing field and is currently maturing in applications such as displays, smart packaging, organic light-emitting diodes and organic photovoltaic cells. In order to process on flexible substrates at high throughput and large areas, novel patterning techniques will be essential. Conventional optical lithography is limited in throughput as well as resolution, and requires several alignment steps to generate multi-layered patterns, required for applications such as thin-film transistors. It therefore remains a complex and expensive process. Nanoimprint lithography is an emerging alternative to optical lithography, demonstrating patterning capabilities over a wide range of resolutions, from several microns down to a few nanometres. For display applications, nanoimprint lithography can be used to pattern various layers. Micron sized thin-film transistors for backplane can be fabricated where a self-aligned geometry is used to decrease the number of alignment steps, and increase the overlay accuracy. In addition, nano-structures can be used for optical applications such as anti-reflective surfaces and nano patterned transparent electrodes. Imprint lithography is a fully roll-to-roll compatible process and enables large area and high throughput fabrication for flexible electronics. In this paper we discuss the possibilities and the challenges of large area patterning by roll-to-roll nanoimprint lithography, reviewing micron and nano sized structures realized on our roll-to-roll equipment. Nano patterned transparent electrodes, moth-eye antireflective coatings, and multilevel structures will be covered.

Citation Download Citation

Sami Sabik, Joris de Riet, Iryna Yakimets, and Edsger Smits "High resolution patterning for flexible electronics via roll-to-roll nanoimprint lithography", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490F (28 March 2014); https://doi.org/10.1117/12.2046479

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available