Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate

James H. Smith II; Nigel Crosland; Samuel Doran; Robert C. Dowling Jr.; John G. Hartley; Philip C. Hoyle; David M. P. King; Lawrence Kutcher Jr.; Andrew McClelland; Martin Turnidge

doi:10.1117/12.2046609

28 March 2014 Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate

James H. Smith II, Nigel Crosland, Samuel Doran, Robert C. Dowling Jr., John G. Hartley, Philip C. Hoyle, David M. P. King, Lawrence Kutcher Jr., Andrew McClelland, Martin Turnidge

Author Affiliations +

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90490O (2014) https://doi.org/10.1117/12.2046609
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The Vistec VB300¹ Gaussian electron-beam lithography system at the College of Nanoscale Science and Engineering (CNSE) in Albany routinely exposes 300 mm wafers to meet the requirements of nano-patterning for metrology and process tool qualification. CNSE and Vistec are partners in a continuous throughput improvement program. The second set of upgrades from this program has recently been implemented on CNSE’s VB300 and includes an increase in the maximum exposure clock frequency to 100 MHz and corresponding improvements to the sub-field deflection and beam blanker. To quantify the improvements, we have used an established suite of benchmark patterns² to compare throughput “before and after”. These benchmark patterns show an average throughput improvement factor of 4 times over the timings at the start of the continuous improvement program.

Citation Download Citation

James H. Smith II, Nigel Crosland, Samuel Doran, Robert C. Dowling Jr., John G. Hartley, Philip C. Hoyle, David M. P. King, Lawrence Kutcher Jr., Andrew McClelland, and Martin Turnidge "Increased throughput, determined by a suite of benchmark patterns, in a Gaussian electron-beam lithography tool with a 100 MHz writing rate", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490O (28 March 2014); https://doi.org/10.1117/12.2046609

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available