28 March 2014 Demonstration of EDA flow for massively parallel e-beam lithography
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Abstract
Today’s soaring complexity in pushing the limits of 193nm immersion lithography drives the development of other technologies. One of these alternatives is mask-less massively parallel electron beam lithography, (MP-EBL), a promising candidate in which future resolution needs can be fulfilled at competitive cost. MAPPER Lithography’s MATRIX MP-EBL platform has currently entered an advanced stage of development. The first tool in this platform, the FLX 1200, will operate using more than 1,300 beams, each one writing a stripe 2.2μm wide. 0.2μm overlap from stripe to stripe is allocated for stitching. Each beam is composed of 49 individual sub-beams that can be blanked independently in order to write in a raster scan pixels onto the wafer.
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P. Brandt, J. Belledent, C. Tranquillin, T. Figueiro, S. Meunier, S. Bayle, A. Fay, M. Milléquant, B. Icard, M. Wieland, "Demonstration of EDA flow for massively parallel e-beam lithography", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904915 (28 March 2014); doi: 10.1117/12.2046091; https://doi.org/10.1117/12.2046091
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