28 March 2014 New lithography technology for sub-10nm patterning with shrinking organic material
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Abstract
For making sub-10nm patterns, new lithography technology is proposed in this paper. This is a cost-effective new lithography process using the special organic material which is able to reduce a pattern size by shrinking. Shrinking ratio of various methods, decreasing line edge roughness (LER) and patterning of less than 10nm half pitch size are reported.
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Seiji Morita, Seiji Morita, } "New lithography technology for sub-10nm patterning with shrinking organic material", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491I (28 March 2014); doi: 10.1117/12.2046307; https://doi.org/10.1117/12.2046307
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