Photoinhibited superresolution lithography: overcoming chemical blur

Darren L. Forman; Robert R. McLeod

doi:10.1117/12.2063254

28 March 2014 Photoinhibited superresolution lithography: overcoming chemical blur

Darren L. Forman, Robert R. McLeod

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90491W (2014) https://doi.org/10.1117/12.2063254
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Photoinhibited superressolution (PInSR) lithography is a two--color, one-photon scheme that promises high throughput far-field patterning t deep subwwabvelength scales. Previous work ha shown that the technique susceptible to blurring from active species diffusion, an issue which we have recently overcome with the use of a low-diffiusivity methrylate resist. Here we present out first clear demonstration of superresolution, showing feature spacing 3X better than the 0.2 NA diffraction limit.

Citation Download Citation

Darren L. Forman and Robert R. McLeod "Photoinhibited superresolution lithography: overcoming chemical blur", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491W (28 March 2014); https://doi.org/10.1117/12.2063254

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