New inspection technology for observing nanometer size defects using expansion soft template

Seiji Morita; Ryoji Yoshikawa; Takashi Hirano; Tatsuhiko Higashiki

doi:10.1117/12.2046326

2 April 2014 New inspection technology for observing nanometer size defects using expansion soft template

Seiji Morita, Ryoji Yoshikawa, Takashi Hirano, Tatsuhiko Higashiki

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90501A (2014) https://doi.org/10.1117/12.2046326
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

For sub-10nm lithography for semiconductor devices, inspection technologies for detecting nanometer size defects become quite important. In the case of optical inspection, it is difficult to detect a defect whose size is less than 23nm because of optical resolution limit. This paper describes a cost-effective inspection technology for detecting a nanometer size defect with the optical inspection technology using replicated soft template which is able to enlarge a defect size by expanding. Feasibility of detecting 9.6nm defect with optical inspection is reported.

Citation Download Citation

Seiji Morita, Ryoji Yoshikawa, Takashi Hirano, and Tatsuhiko Higashiki "New inspection technology for observing nanometer size defects using expansion soft template", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501A (2 April 2014); https://doi.org/10.1117/12.2046326

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