2 April 2014 New inspection technology for observing nanometer size defects using expansion soft template
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Abstract
For sub-10nm lithography for semiconductor devices, inspection technologies for detecting nanometer size defects become quite important. In the case of optical inspection, it is difficult to detect a defect whose size is less than 23nm because of optical resolution limit. This paper describes a cost-effective inspection technology for detecting a nanometer size defect with the optical inspection technology using replicated soft template which is able to enlarge a defect size by expanding. Feasibility of detecting 9.6nm defect with optical inspection is reported.
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Seiji Morita, Seiji Morita, Ryoji Yoshikawa, Ryoji Yoshikawa, Takashi Hirano, Takashi Hirano, Tatsuhiko Higashiki, Tatsuhiko Higashiki, } "New inspection technology for observing nanometer size defects using expansion soft template", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501A (2 April 2014); doi: 10.1117/12.2046326; https://doi.org/10.1117/12.2046326
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