2 April 2014 New inspection technology for observing nanometer size defects using expansion soft template
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Abstract
For sub-10nm lithography for semiconductor devices, inspection technologies for detecting nanometer size defects become quite important. In the case of optical inspection, it is difficult to detect a defect whose size is less than 23nm because of optical resolution limit. This paper describes a cost-effective inspection technology for detecting a nanometer size defect with the optical inspection technology using replicated soft template which is able to enlarge a defect size by expanding. Feasibility of detecting 9.6nm defect with optical inspection is reported.
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Seiji Morita, Ryoji Yoshikawa, Takashi Hirano, Tatsuhiko Higashiki, "New inspection technology for observing nanometer size defects using expansion soft template", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501A (2 April 2014); doi: 10.1117/12.2046326; https://doi.org/10.1117/12.2046326
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