Visualization of Si surface and interface quality by non-contact optical characterization techniques

Woo Sik Yoo; Kitaek Kang; Toshikazu Ishigaki; Takeshi Ueda

doi:10.1117/12.2048242

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2 April 2014 Visualization of Si surface and interface quality by non-contact optical characterization techniques

Woo Sik Yoo, Kitaek Kang, Toshikazu Ishigaki, Takeshi Ueda

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Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90501I (2014) https://doi.org/10.1117/12.2048242
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Si lattice stress at or near the surface, and overall quality of the Si surface and interface were characterized using multi-wavelength, high resolution Raman and photoluminescence (PL) spectroscopy. Depth profiling of Si lattice stress and electrically active defects/traps, at or near the Si surface and interface, was done using ultraviolet (UV) to infrared (IR) light sources, with different probing depths. Significant variations in Si lattice stress, Si bond lengths and electrically active defects/traps were found from Si wafers undergoing various process steps. Visualization of Si surface and interface quality was done on Si wafers following various device fabrication steps.

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Woo Sik Yoo, Kitaek Kang, Toshikazu Ishigaki, and Takeshi Ueda "Visualization of Si surface and interface quality by non-contact optical characterization techniques", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501I (2 April 2014); https://doi.org/10.1117/12.2048242

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