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2 April 2014 Integrated ADI optical metrology solution for lithography process control of CD and OV
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Abstract
Integrated metrology in the lithography cluster is a promising solution to tighten process control. It is shown that optical CD metrology using YieldStar, an angular resolved scatterometer, meets all requirements in terms of precision, process robustness, throughput and matching to CD-SEM, the current tool-of-reference. The same metrology tool supports also diffraction-based overlay metrology. Using an appropriate sampling plan and the full scanner correction capabilities, overlay control can be improved. The throughput of the integrated tool is sufficient to support high volume sampling plans for combined CD and overlay monitoring and control, with 100% lot coverage.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marlene Strobl, Wilhelm Tsai, Andy Lan, Tom Chen, Wilson Hsu, Henry Chen, Frida Liang, Alan Wang, Platt Hung, David Huang, Ethan Chiu, Paul Yu, Yi Song, Sylvia Yuan, Remco Dirks, Noelle Wright, Mariya Ponomarenko, Hugo Cramer, Baukje Wisse, Vincent Couraudon, Bijoy Rajasekharan, Reinder Plug, Stefan Kruijswijk, and Henk Niesing "Integrated ADI optical metrology solution for lithography process control of CD and OV", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501J (2 April 2014); https://doi.org/10.1117/12.2047205
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