2 April 2014 Macroscopic exploration and visual quality inspection of thin film deposit
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Micro/nanotechnologies evolve causing an evolution of surface characterization systems of thin films. Today, these systems are not adapted to the future needs (or current) to characterize and qualify a large effective area within industrial production. This concerns the thin film active layers or simple mask for structuring the surface. This paper proposes a quality control method for thin films of self-assembled particles and high quality. This method is founded on the intersection of several skills available in our laboratories: Industrial process of visual inspection, optical methods for quality control (large area relative to the state of the art) and advances in micro/nanotechnology (CEA/Liten).
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Simon-Frédéric Désage, Gilles Pitard, Hugues Favrelière, Maurice Pillet, Olivier Dellea, Pascal Fugier, Philippe Coronel, Emmanuel Ollier, "Macroscopic exploration and visual quality inspection of thin film deposit", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502G (2 April 2014); doi: 10.1117/12.2046246; https://doi.org/10.1117/12.2046246

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