14 April 2014 Run time scanner data analysis for HVM lithography process monitoring and stability control
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Abstract
There are various data mining and analysis tools in use by high-volume semiconductor manufacturers throughout the industry that seek to provide robust monitoring and analysis capabilities for the purpose of maintaining a stable lithography process. These tools exist in both online and offline formats and draw upon data from various sources for monitoring and analysis. This paper explores several possible use cases of run-time scanner data to provide advanced overlay and imaging analysis for scanner lithography signatures. Here we demonstrate several use-cases for analyzing and stabilizing lithography processes. Applications include high order wafer alignment simulations in which an optimal alignment strategy is determined by dynamic wafer selection, reporting statistics data and analysis of the lot report and the sub-recipe as a sort of non-standard lot report, visualization of key lithography process parameters, and scanner fleet management (SFM)
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Woong Jae Chung, Woong Jae Chung, Young Ki Kim, Young Ki Kim, John Tristan, John Tristan, Jeong Soo Kim, Jeong Soo Kim, Lokesh Subramany, Lokesh Subramany, Chen Li, Chen Li, Brent Riggs, Brent Riggs, Vidya Ramanathan, Vidya Ramanathan, Ram Karur-Shanmugam, Ram Karur-Shanmugam, George Hoo, George Hoo, Jie Gao, Jie Gao, Anna Golotsvan, Anna Golotsvan, Kevin Huang, Kevin Huang, Bill Pierson, Bill Pierson, John Robinson, John Robinson, } "Run time scanner data analysis for HVM lithography process monitoring and stability control", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502J (14 April 2014); doi: 10.1117/12.2046330; https://doi.org/10.1117/12.2046330
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