2 April 2014 Implementation of background scattering variance reduction on the rapid nano particle scanner
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Abstract
The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner. This illumination method reduces the variance of the background scattering on substrate roughness. It allows for a lower setting of the detection threshold, resulting in a more sensitive inspection system. By implementing this system the lower detection limit of the scanner was reduced from 59 nm to 42 nm LSE. A next improvement, a change of the inspection wavelength to 193 nm will bring the detection limit to sub 20 nm.
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Peter van der Walle, Sandro Hannemann, Daan van Eijk, Wouter Mulckhuyse, Jacques C. J. van der Donck, "Implementation of background scattering variance reduction on the rapid nano particle scanner", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905033 (2 April 2014); doi: 10.1117/12.2048684; https://doi.org/10.1117/12.2048684
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