Advanced SEM simulation has become a key element in the ability of SEM
inspection, metrology and defect review to meet the challenges of advanced technologies.
It grants additional capabilities to the end user, such as 3D height measurements, accurate
virtual metrology, and supports Design Based Metrology to bridge the gap between
design layout and SEM image.
In this paper we present SEM simulations capabilities, which take into
consideration all parts of the SEM physical and electronic path, interaction between
Electron beam and material, multi perspective SEM imaging and shadowing derived from
proximity effects caused by the interaction of the Secondary Electrons signal with
neighboring pattern edges.
Optimizing trade-off between simulation accuracy, calibration procedures and
computational complexity, the simulation is running in real-time with minimum impact
Experiment results demonstrate Height measurement capacities, and CAD based
simulated pattern is compared with SEM image to evaluate simulated pattern fidelity.