Reduction of image placement error on photomask-making for multiple patterning

Takahiro Hiromatsu; Toru Fukui; Kenta Tsukagoshi; Kazunori Ono; Masahiro Hashimoto

doi:10.1117/12.2046777

27 March 2014 Reduction of image placement error on photomask-making for multiple patterning

Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90510U (2014) https://doi.org/10.1117/12.2046777
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

To make photomasks with high overlay accuracy, “Charge Dissipation Layer (CDL)” materials have been developed. Commercialized CDL materials can reduce electro-static charging on the surface of resist during electron beam exposure. However, some side effects are introduced to the mask-making process. The resolution performance of chemically amplified resist (CAR) is degraded owing to acid diffusion from the CDL components to the resist surface. A newly developed CDL solved this problem by controlling the acid diffusion. A positive-tone CAR with the CDL showed no resolution degradation, and performance was maintained for over 30 days after coating CDL and resist. Furthermore, the CDL has been evaluated on a negative-tone CAR which is more sensitive to CDL.

Citation Download Citation

Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, and Masahiro Hashimoto "Reduction of image placement error on photomask-making for multiple patterning", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510U (27 March 2014); https://doi.org/10.1117/12.2046777

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