27 March 2014 Reduction of image placement error on photomask-making for multiple patterning
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Abstract
To make photomasks with high overlay accuracy, “Charge Dissipation Layer (CDL)” materials have been developed. Commercialized CDL materials can reduce electro-static charging on the surface of resist during electron beam exposure. However, some side effects are introduced to the mask-making process. The resolution performance of chemically amplified resist (CAR) is degraded owing to acid diffusion from the CDL components to the resist surface. A newly developed CDL solved this problem by controlling the acid diffusion. A positive-tone CAR with the CDL showed no resolution degradation, and performance was maintained for over 30 days after coating CDL and resist. Furthermore, the CDL has been evaluated on a negative-tone CAR which is more sensitive to CDL.
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Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto, "Reduction of image placement error on photomask-making for multiple patterning", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510U (27 March 2014); doi: 10.1117/12.2046777; https://doi.org/10.1117/12.2046777
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