Paper
27 March 2014 New materials for directed self-assembly for advanced patterning
Jieqian Zhang, Janet Wu, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold, Michael B. Clark, Peter Trefonas III, Phillip D. Hustad
Author Affiliations +
Abstract
Directed Self-Assembly (DSA) of block copolymers is a candidate advanced patterning technology at future technology nodes. Although DSA promises resolution and cost benefits, a number of constraints and challenges remain for its implementation. Poly(styrene-block-methyl methacrylate) (PS-b-PMMA) has been widely studied in DSA and applied in various applications to demonstrate the potential of DSA to extend optical lithography, including line space and contact hole patterning and uniformity repair,. However, the relatively weak segregation strength of PS-b-PMMA limits its capability to pattern sub-10 nm features. This paper presents the use of strongly segregated high X block copolymers to enable sub-10 nm patterning. Chemoepitaxy DSA with high X lamellar block copolymers is demonstrated with two different strategies based on thermal annealing process and no top coat. These technologies hold promise to enable the implementation of DSA at future technology nodes.
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Jieqian Zhang, Janet Wu, Mingqi Li, Valeriy V. Ginzburg, Jeffrey D. Weinhold, Michael B. Clark, Peter Trefonas III, and Phillip D. Hustad "New materials for directed self-assembly for advanced patterning", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905111 (27 March 2014); https://doi.org/10.1117/12.2046328
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Cited by 5 scholarly publications.
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KEYWORDS
Annealing

Directed self assembly

Optical lithography

Etching

Interfaces

Scanning electron microscopy

Coating

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