27 March 2014 Patterning chemistry of HafSOx resist
Author Affiliations +
Abstract
A combination of ICP-OES, titration, and Raman spectroscopy was used to determine the ratio of peroxide to hafnium in the inorganic photoresist HafSOx. By using ICP-OES to determine the hafnium concentration and titration with permanganate to determine peroxide in a solution of dissolved films, the Hf:O22- ratio was found to be approximately 2:1 in the films. From Raman measurements on precursor solutions, it was determined that that Hfbound peroxide saturated at this level. Film insolubility is induced through loss of approximately 75% of bound peroxide following exposure to a 30-keV electron beam.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jenn M. Amador, Shawn R. Decker, Stefan E. Lucchini, Rose E. Ruther, Douglas A. Keszler, "Patterning chemistry of HafSOx resist", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511A (27 March 2014); doi: 10.1117/12.2046605; https://doi.org/10.1117/12.2046605
PROCEEDINGS
6 PAGES


SHARE
Back to Top