27 March 2014 Modeling acid transport in chemically amplified resist films
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Abstract
The acid-catalyzed deprotection of glassy poly(4-hydroxystyrene-co-tert butyl acrylate) films was studied with infrared absorbance spectroscopy and stochastic simulations. Experimental data were interpreted with a simple description of subdiffusive acid transport coupled to second-order acid loss. This model predicts key attributes of observed deprotection rates, such as fast reaction at short times, slow reaction at long times, and a non-linear dependence on acid loading. The degree of anomalous character is reduced by increasing the post-exposure bake temperature or adding plasticizing agents to the polymer resin. These findings indicate that the acid mobility and overall deprotection kinetics are coupled to glassy matrix dynamics. Furthermore, the acid diffusion lengths were calculated from the anomalous transport model and compared with nanopattern line widths. The consistent scaling between experiments and simulations suggests that the anomalous diffusion model could be further developed into a predictive lithography tool.
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Abhijit A. Patil, Manolis Doxastakis, Gila E. Stein, "Modeling acid transport in chemically amplified resist films", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511M (27 March 2014); doi: 10.1117/12.2046473; https://doi.org/10.1117/12.2046473
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