Fluidity dependence of deprotonation kinetics of chemically amplified resist

Kazumasa Okamoto; Takuya Ishida; Hiroki Yamamoto; Takahiro Kozawa; Ryoko Fujiyoshi; Kikuo Umegaki

doi:10.1117/12.2046057

27 March 2014 Fluidity dependence of deprotonation kinetics of chemically amplified resist

Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511T (2014) https://doi.org/10.1117/12.2046057
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Chemically amplified resists have been widely used in the mass production line. An acid generation mechanism induced by ionizing radiation with extreme ultraviolet (EUV) and electron beam is an important issue for improvement of the resist performance such as sensitivity, roughness, and resolution below 16 nm. However, the details of deprotonation kinetics from the ionized resist solid film immediately after the ionization have been still unclear. In this study, pulse radiolysis of highly concentrated poly(4-hydroxystylene) (PHS) solutions was performed. The viscosity dependence on the deprotonation dynamics of the ionized concentrated solutions was investigated to clarify the proton generation of ionized PHS in a medium with low mobility. The deprotonation from the PHS radical cation becomes slower with increasing PHS concentration. It is suggested that the deprotonation reaction is slower in a less mobile medium because of decrease of the molecular motions.

Citation Download Citation

Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, and Kikuo Umegaki "Fluidity dependence of deprotonation kinetics of chemically amplified resist", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511T (27 March 2014); https://doi.org/10.1117/12.2046057

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