31 March 2014 Dual photoresist complimentary lithography technique produces sub-micro patterns on sapphire substrates
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Dual photoresist complimentary lithography technique consisting of inorganic oxide photoresist and organic photoresist is applied to produce the sub-micro pit patterns on a sapphire surface. The oxide photoresist is patterned by the direct laser writing and the developed mark size decreases to a smaller value than the laser spot size due to the thermal lithography. The small developed pit diameter is one of the advantages using oxide photoresist. The oxide photoresist possesses strong etching resistance against the oxygen plasma but shows no resistance against the chlorine plasma. The chlorine plasma is a necessary component to etch the sapphire during the ion-coupled-plasma reactive-ion-etching process because of sapphire’s mechanical hardness and chemical stability. However, the characteristics of organic resist SU8 are opposite to that of oxide photoresist and possess moderate resistance against chlorine plasma but show no resistance to oxygen plasma. The thermal and developing characteristics of oxide photoresist are reported here. The dependence of the laser power on the developed mark sizes and morphologies is illustrated by atomic force microscopy. The temperature distribution on the photoresist structure during the laser writing is simulated. Images of patterned pits on the large commercial sapphire substrates are also shown.
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Chun-Ming Chang, Chun-Ming Chang, Shih-Feng Tseng, Shih-Feng Tseng, Chao-Te Lee, Chao-Te Lee, Wen-Tse Hsiao, Wen-Tse Hsiao, Jer-Liang Andrew Yeh, Jer-Liang Andrew Yeh, Donyau Chiang, Donyau Chiang, "Dual photoresist complimentary lithography technique produces sub-micro patterns on sapphire substrates", Proc. SPIE 9052, Optical Microlithography XXVII, 90521R (31 March 2014); doi: 10.1117/12.2044900; https://doi.org/10.1117/12.2044900

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