31 March 2014 UV-LED exposure system for low-cost photolithography
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Abstract
This paper reports the development of a low-cost, portable, light-emitting diode (LED)-based UV exposure system for photolithography. The major system components include UV-LEDs, microcontroller, digital-to-analog (D/A) converter and LED control circuitry. The UV-LED lithography system is also equipped with a digital user interface (LCD and keypad) and permits accurate electronic control on the exposure time and power. Hence the exposure dose can be varied depending on process requirements. Compared to traditional contact lithography, the UV-LED lithography system is significantly cheaper, simple to construct using off-the shelf components and does not require complex infrastructure to operate. Such reduction in system cost and complexity renders UV-LED lithography as a perfect candidate for micro lithography with large process windows typically suitable for MEMS, microfluidics applications.
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Murat Kaya Yapici, Ilyas Farhat, "UV-LED exposure system for low-cost photolithography", Proc. SPIE 9052, Optical Microlithography XXVII, 90521T (31 March 2014); doi: 10.1117/12.2046123; https://doi.org/10.1117/12.2046123
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