28 March 2014 Decomposition-aware layout optimization for 20/14nm standard cells
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Abstract
Decomposition-aware layout design improvements for 8, 9, 11, and 13-track 20/14nm standard cells are presented. Using a decomposition-aware scoring methodology that quantifies the manufacturability of layouts, the Double Patterning Technology (DPT)-compliant layouts are optimized for DPT-specific metrics that include: the density difference between the two decomposition mask layers, the enclosure of stitching areas, the density of stitches, and the design regularity of stitching areas. For a 9-track standard cell, eliminating the stitches from the layout design improved the composite score from 0.53 to 0.70.
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Lynn T. -N. Wang, Sriram Madhavan, Shobhit Malik, Eric Chiu, Luigi Capodieci, "Decomposition-aware layout optimization for 20/14nm standard cells", Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 90530W (28 March 2014); doi: 10.1117/12.2046147; https://doi.org/10.1117/12.2046147
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