Advanced plasma sources for the future 450mm etch process

Y. S. Lee; J. W. Lee; G. J. Park; H. Y. Chang

doi:10.1117/12.2046660

28 March 2014 Advanced plasma sources for the future 450mm etch process

Y. S. Lee, J. W. Lee, G. J. Park, H. Y. Chang

Proceedings Volume 9054, Advanced Etch Technology for Nanopatterning III; 90540K (2014) https://doi.org/10.1117/12.2046660
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In this paper, we have introduced various plasma source concepts for large-area plasma processing with a brief review of the experimental and simulation results. A multi-radio-frequency (RF) feed design, multi-electrode concepts are suggested to enhance the plasma uniformity, and, a multi-ICP source is introduced for large-area, ultra-low pressure processes to remove standing-wave and skin effects causing the processing output to be non-uniform. Using multi-feeds to connect separated electrodes in a multi-electrode is one method of uniformity control. A multi-plasma source can also be used to increase the plasma uniformity, which makes it possible to enlarge the processing area. A parallel array of the ICP sources can decrease the total impedance of the system and enable a high electron density to be achieved. We discussed the asymmetric factors including the chamber wall potential profile, stray capacitance, and gas distribution. Finally some issues regarding the control of the plasma parameters through adjustment of the excitation frequency and RF power, operating pressure, gas mixing ratio, and other external parameters to optimize large-area plasma processing are mentioned.

Citation Download Citation

Y. S. Lee, J. W. Lee, G. J. Park, and H. Y. Chang "Advanced plasma sources for the future 450mm etch process", Proc. SPIE 9054, Advanced Etch Technology for Nanopatterning III, 90540K (28 March 2014); https://doi.org/10.1117/12.2046660

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available