16 December 2013 Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio
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Proceedings Volume 9068, Eighth International Conference on Thin Film Physics and Applications; 90680C (2013) https://doi.org/10.1117/12.2053143
Event: Eighth International Conference on Thin Film Physics and Applications (TFPA13), 2013, Shanghai, China
Abstract
Feasibility of thin films deposited on inner wall of rectangular pipes with length aspect ratio up to 50 by atomic layer deposition was studied, by solving kinetics equation of gas adsorption on inner wall of pipes. And the time for reactants to reach saturated adsorption in pipes was calculated. Furthermore, the process of thin film deposition by atomic layer deposition was simulated by Kinetic Monte Carlo method, and a growth model for atomic layer deposition of aluminum on inner wall of long rectangular pipes was established.
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Yuqing Xiong, Yuqing Xiong, Maojin Dong, Maojin Dong, Kun Li, Kun Li, Jizhou Wang, Jizhou Wang, Ni Ren, Ni Ren, } "Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio ", Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90680C (16 December 2013); doi: 10.1117/12.2053143; https://doi.org/10.1117/12.2053143
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