16 December 2013 The influence of annealing condition on the properties of the Co-Sb thermoelectric thin films prepared by ion beam sputtering
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Proceedings Volume 9068, Eighth International Conference on Thin Film Physics and Applications; 90681F (2013) https://doi.org/10.1117/12.2054018
Event: Eighth International Conference on Thin Film Physics and Applications (TFPA13), 2013, Shanghai, China
Abstract
Co-Sb based thermoelectric materials has been identified as a new promising thermoelectric material because of its extremely high hole mobility, high thermoelectric power, and relatively low thermal conductivity due to complexity in the crystal structure. In this work, Co-Sb based thin films were prepared by ion beam sputtering technique and the annealing process had been used to optimize the thermoelectric properties of the thin films. The results indicate that the thin films annealed at vacuum chamber with the chamber pressure of 6.0×10-4 Pa has worse thermoelectric properties than the thin films annealed at Ar atmosphere. The thin film with single CoSb3 phase which annealed at 400°C at Ar atmosphere has a maximum power factor of 1.8 mWm-1K-2 with the Seebeck coefficient of 50 μV/K and the conductivity of 7×105 Sm-1. Also, the thermoelectric voltage of the thin film is stable through the testing temperature increases.
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Yin Zhang, Yin Zhang, Ping Fan, Ping Fan, Zhuang-hao Zheng, Zhuang-hao Zheng, Wei-fang Fan, Wei-fang Fan, Dong-ping Zhang, Dong-ping Zhang, Jing-ting Luo, Jing-ting Luo, Guang-xing Liang, Guang-xing Liang, } "The influence of annealing condition on the properties of the Co-Sb thermoelectric thin films prepared by ion beam sputtering", Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90681F (16 December 2013); doi: 10.1117/12.2054018; https://doi.org/10.1117/12.2054018
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