21 May 2014 Low-cost photonic crystals for spectral sensors fabricated using projection lithography
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Abstract
Nanophotonic structures including photonic crystals and plasmonics have a lot of potential applications in spectral sensing. These devices typically require electron beam lithography, a slow process, for fabrication. Successful commercialization of these technologies requires reproducible, high volume fabrication. Projection lithography is an established process for rapid, reproducible patterning. We have successfully pushed the limits of projection lithography to develop a low-cost, high-throughput alternative to electron beam lithography for our nanoscale, visible-wavelength photonic crystal spectral sensors. The developed process is 100 times faster than electron beam lithography for 10mm by 10mm dies on a four inch wafer. Testing of the photonic crystals in spectral sensors shows uniformity in large scale production which is robust to defects from processing.
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Tanya Cruz Garza, Tanya Cruz Garza, James I. Scholtz, James I. Scholtz, Michael J. Gazes, Michael J. Gazes, Ioannis Kymissis, Ioannis Kymissis, Nadia K. Pervez, Nadia K. Pervez, "Low-cost photonic crystals for spectral sensors fabricated using projection lithography", Proc. SPIE 9101, Next-Generation Spectroscopic Technologies VII, 91010F (21 May 2014); doi: 10.1117/12.2053575; https://doi.org/10.1117/12.2053575
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