You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
1 May 2014Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry
Scatterometry is a common tool for the dimensional characterization of periodic nanostructures. In this paper we compare measurement results of two different scatterometric methods: a goniometric DUV scatterometer and a coherent scanning Fourier scatterometer. We present a comparison between these two methods by analyzing the measurement results on a silicon wafer with 1D gratings having periods between 300 nm and 600 nm. The measurements have been performed with PTB’s goniometric DUV scatterometer and the coherent scanning Fourier scatterometer at TU Delft. Moreover for the parameter reconstruction of the goniometric measurement data, we apply a maximum likelihood estimation, which provides the statistical error model parameters directly from measurement data.
The alert did not successfully save. Please try again later.
J. Endres, N. Kumar, P. Petrik, M. -A. Henn, S. Heidenreich, S. F. Pereira, H. P. Urbach, B. Bodermann, "Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry," Proc. SPIE 9132, Optical Micro- and Nanometrology V, 913208 (1 May 2014); https://doi.org/10.1117/12.2052819