1 May 2014 AZO electrodes deposited by atomic layer deposition for OLED fabrication
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Abstract
In this work, we present a comparative study of optimized AZO electrodes deposited by Atomic Layer Deposition (ALD) with commercial ITO in terms of electrical, optical and structural properties. Despite a lower figure of merit mainly due to a higher sheet resistance, AZO-based OLEDs are shown to present a current density five times higher than ITO-based ones for the same applied voltage. These AZO electrodes fabricated by ALD could thus be promising substitutes for conventional ITO anodes in organic electronic devices.
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B. Dugrenil, B. Dugrenil, I. Séguy, I. Séguy, Hsin-Ying Lee, Hsin-Ying Lee, T. Camps, T. Camps, Y.-C. Lin, Y.-C. Lin, J. B. Doucet, J. B. Doucet, Y.-S. Chiu, Y.-S. Chiu, L. Salvagnac, L. Salvagnac, E. Bedel-Pereira, E. Bedel-Pereira, M. Ternisien, M. Ternisien, C. T. Lee, C. T. Lee, V. Bardinal, V. Bardinal, } "AZO electrodes deposited by atomic layer deposition for OLED fabrication", Proc. SPIE 9137, Organic Photonics VI, 91371D (1 May 2014); doi: 10.1117/12.2052504; https://doi.org/10.1117/12.2052504
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